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Laser gas replenishment method

Invented by: Hans-Stephan Albrecht
Gottingen, DE

Klaus Wolfgang Vogler
Eckental, DE

Juergen Kleinschmidt
Weissenfels, DE

Thomas Schroeder
Gottingen, DE

Igor Bragin
Gottingen, DE

Vadim Berger
Gottingen, DE

Uwe Stamm
Gottingen, DE

Wolfgang Zschocke
Noerten-Hardenberg, DE

Sergei Govorkov
Boca Raton, FL

Originally Assigned to: Lambda Physik AG
Goettingen, DE
[Now assigned to . . .]

Issued:2007-09-04
Filed:2005-10-31
Application No:11263626
Examined by:Rodriguez; Armando

Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.

[pdf] U.S. Pat. No. 7,266,137

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