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Apparatus and method for indirect surface cleaning

Invented by: Jeffrey E. LeClaire
Boca Raton, FL

Kenneth G. Roessler
Boca Raton, FL

David Brinkley
Baltimore, MD

Originally Assigned to: Rave, LLC
Delray Beach, FL
[Now assigned to . . .]

Issued:2012-10-23
Filed:2008-11-24
Application No:12277106
Examined by:Kornakov; Michael

Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.

[pdf] U.S. Pat. No. 8,293,019

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