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Apparatus and method for indirect surface cleaning

Invented by: Jeffrey E. LeClaire
Boca Raton, FL

Kenneth G. Roessler
Boca Raton, FL

David Brinkley
Baltimore, MD Applicant: Name City State Country Type Rave, LLC Delray Beach FL US

Originally Assigned to: Rave, LLC
Delray Beach, FL
[Now assigned to . . .]

Issued:2013-12-24
Filed:2012-10-22
Application No:13657847
Examined by:Blan; Nicole

Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, the surface of a substrate having a contaminating particulate disposed thereon is cleaned by directing a laser towards the substrate, generating a temperature increase in the substrate and transferring thermal energy from the substrate to the particulate to decompose the particulate. The laser has a wavelength that is substantially the same as a local maximum of the substrate absorption spectrum.

[pdf] U.S. Pat. No. 8,613,803

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